Cadence PEGASUS DFM 23.22.000 Linux

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Cadence Design Systems, Inc., the leader in global electronic design innovation, has unveiledPEGASUS DFM 23.22.000is complete suite of manufacturability and variability solutions is used by both designers and manufacturers to improve design manufacturability and reduce the time to yield
Owner:Cadence Design Systems, Inc.
Product:PEGASUS DFM
Version:23.22.000 *
Supported Architectures:lnx86
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Languages Supported:english
System Requirements:Linux **
Size:3.1 Gb

Base_PEGASUSDFM23.20.000_lnx86
Hotfix_PEGASUSDFM23.22.000-ISR2_lnx86
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The Cadence DFM products and their release (MVS) have been rebranded as Pegasus DFM release. REL PEGASUSDFM21.3 is the first Pegasus DFM release by Cadence under the Pegasus brand that includes the same products as MVS. These are as follows:
- Pegasus Layout Pattern Analyzer (Pegasus LPA)
- Pegasus CMP Predictor (Pegasus CMP)
- Pegasus Critical Area Analyzer (Pegasus CAA)
- Pegasus Computational Pattern Analytics (Pegasus CPA)

Cadence DFM solutionsaddress both designer and manufacturer challenges, including lithography, chemical and mechanical polishing (CMP), layout-dependent effects (LDE), layout and yield analysis, and optical proximity correction (OPC). This complete suite of manufacturability and variability solutions is used by both designers and manufacturers to improve design manufacturability and reduce the time to yield.
Cadence DFM solutions comprise:
Litho Physical Analyzer (LPA)
Improves your systematic and parametric yield and meets foundry DFM signoff requirements. Detects and corrects lithography hotspots, based on either fast, accurate silicon contour prediction or high-performance pattern matching. LPA is also integrated into Innovus™ and Virtuoso™ implementation platforms to deliver in-design detection and automated fixing with fast turnaround time, improved fixing rate using LPA fixing guidelines, and ease-of-use though seamless integration. LPA is qualified by all major foundries.
Layout Dependant Effects (LDE) Electrical Analyzer
Allows designers to identify, analyze, and minimize the effect of parametric issues associated with manufacturing variability to improve chip performance.
Cadence CMP Predictor (CCP)
Enhances design performance and yield through model-based entire-stack thickness prediction, CMP hotspot detection, and CMP-aware RC extraction. CCP is qualified by all major foundries.
Process and Proximity Compensation (PPC)
A complete and comprehensive third-generation mask pattern synthesis solution built from the ground up for correct-by-construction OPC with the fastest mask cycle time.
Cadence Pattern Analysis (CPA)
A versatile layout processing tool suite with unmatched performance. Its high-capacity, high-performance layout analysis and optimization for design and manufacturing teams is used to improve manufacturability and reduce time to yield.
Tutorial Cadence DFM Wizard
Here we explore the Cadence DFM Wizard feature in OrCAD and Allegro PCB Editor.
Cadenceis a pivotal leader in electronic systems design, building upon more than 30 years of computational software expertise. The company applies its underlying Intelligent System Design strategy to deliver software, hardware and IP that turn design concepts into reality. Cadence customers are the world's most innovative companies, delivering extraordinary electronic products from chips to boards to complete systems for the most dynamic market applications, including hyperscale computing, 5G communications, automotive, mobile, aerospace, consumer, industrial and healthcare. For eight years in a row, Fortune magazine has named Cadence one of the 100 Best Companies to Work



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